VJ Electronix to demo improved second generation technologies at APEX
VJ Electronix, Inc., the leader in rework technologies and global provider of advanced X-ray inspection systems, will exhibit in Booth #1834 at the 2016 IPC APEX EXPO, scheduled to take place March 15-17, 2016 at the Las Vegas Convention Center. The company will demonstrate the improved Micra system, XQuik II with AccuCount Technology, Summit II and Vertex II.
The popular Micra is designed for rework of smaller, high-performance components, such as chip scale packages (CSP), package on package (PoP) and micro passives (01005). The enhanced Micra provides a larger 35 mm alignment field of view, expanding its range of applications into more automotive, medical and military/aerospace products.
The revolutionary XQuik II with AccuCount Technology is helping manufacturers around the world keep accurate inventory of their component reels. The XQuik system automatically counts components as small as 01005 with better than 99 percent accuracy. The process takes only seconds, and requires no programming. The new XQuik II handles reels from 7 to 15″.
The new Summit II is the latest semi-automated rework system. Improved ergonomics combined with next-generation controls and proven heating technology provide the greatest performance and flexability. Summit II features a smaller footprint, yet larger board capacity with easy to adjust board support fixtures. Enhanced SierraMate software takes the popular user-friendly operation to the next level with a simple icon driven GUI and unmatched flexibility through easily customized operation sequences.
The Vertex II incorporates the latest advances in X-ray imaging components with off-axis viewing, all in a smaller footprint. The system offers VJ’s proven production readiness, superior uptime and unmatched value. The Vertex II, now CT ready, is equipped with a standard high contrast, high resolution CMOS digital detector, can be configured with a variety of X-ray sources and optional detectors to meet specific application needs.